Anne Hathaway has once again proven her status as a fashion icon while filming the much-anticipated sequel, The Devil Wears Prada 2. The Academy Award-winning actress, known for her timeless elegance, has been spotted on set in New York City, giving fans a glimpse of what’s to come in the upcoming film.
A Stylish Return to an Iconic Role
Directed by David Frankel, the comedy-drama marks a grand reunion for the original cast—Anne Hathaway, Meryl Streep, Emily Blunt, and Stanley Tucci—19 years after the release of the first film in 2006. Behind-the-scenes photos continue to circulate online, with each new image fueling speculation about the storyline.
A Possible Funeral Scene?
The latest images have sparked major discussions among fans. Hathaway, who reprises her role as Andy Sachs, was photographed alongside Stanley Tucci (Nigel) in what appeared to be a funeral scene. The pair were seen standing in a cemetery dressed in somber attire, hinting at a potentially emotional plot twist.
Hathaway wore a sleek black dress with a sheer neckline layered under a trench coat, embodying her character’s sophisticated style. Tucci complemented her look with a sharp tailored black suit and glasses. Both actors carried serious expressions, suggesting the funeral scene could mark the loss of a significant character in the sequel.
Fan Speculation on the Storyline
The images have led fans to wonder which beloved character might be mourned in the upcoming film. While no details have been officially confirmed, the spoiler-like photos have already set social media abuzz with theories.
Release Date and Expectations
Backed by 20th Century Studios, The Devil Wears Prada 2 is scheduled for a global theatrical release on May 1, 2026. With the original film being one of the most celebrated fashion-centric movies of the 2000s, expectations are sky-high for its sequel.
As filming continues in New York City, fans can look forward to more glimpses of Anne Hathaway’s striking style and hints at what promises to be a fashionable yet emotional ride.
